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The beam shapes in figures 4 and 10 of the article entitled 'Monte Carlo simulations of nanoscale focused neon ion beam sputtering of copper: elucidating resolution limits and sub-surface damage' [1] should be a summation of 15 × 15 Gaussian beams of 1 nm FWHM instead of a single Gaussian beam of 15 nm FWHM as presented there. Therefore, it is corrected in this corrigendum with new figures. We would like to request the readers to see these new figures (figures 1 and 2 of this corrigendum instead of figures 4 and 10 respectively of the article [1]). The analysis and text discussion of the article [1] are not affected by the errors.
Figure 1. Simulated via structures of Cu at the doses of (a) 1.5 × 1018 ions cm−2, (b) 3 × 1018 ions cm−2 and (c) 6 × 1018 ions cm−2 and the beam energy of 20 keV. The color code: blue (substrate), red (sputtered), yellow (re-deposited) and cyan (sputtered but re-deposited) depict different species. The white dotted curves represent the summation of 15 × 15 Gaussian beams (of 1 nm FWHM) in each plot.
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Figure 2. Nuclear energy loss density at Cu target with 702 000 neon ions (a dose of 3.12 × 1017 Ne+ cm−2) of 20 keV. The inner plot of (a) depicts the sputtering profile and figure 2(b) is a zoomed region of the rectangle shown in (a). The dark blue color of figure 2(b) represents nuclear energy loss of 1 keV nm3 or less.
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